Recently, the Dutch government announced the expansion of export controls on advanced semiconductor manufacturing equipment. Once this news came out, it attracted extensive attention from the industry.
It is understood that from September 7, more types of semiconductor manufacturing equipment will be restricted by national authorization requirements. The Dutch government said that this move is out of security considerations, as technological progress has led to an increase in security risks related to the export of specific manufacturing equipment, especially in the current geopolitical context.
As a giant in the global lithography machine field, ASML then responded to this. ASML said that according to the updated license requirements, ASML will need to apply for an export license for the Twinscan NXT:1970i and 1980i immersion DUV lithography machines from the Dutch government instead of the US government. However, ASML also emphasized that this is a technical change and is not expected to have any impact on the company's financial outlook for 2024 or its long-term plans.
As early as September last year, the export control measures for semiconductor manufacturing equipment in the Netherlands officially took effect. At that time, the most advanced immersion DUV lithography machines of ASML had been restricted. And the equipment focused on by this restriction measure is ASML's Twinscan NXT:1970i and 1980i immersion DUV lithography systems. The United States previously issued regulations aiming to cut off exports of key chips and semiconductor tools to China and pressured countries such as the Netherlands to increase export restrictions on key chip manufacturing tools. This measure of the Dutch government will undoubtedly have an important impact on the global semiconductor industry pattern and also make the competition and cooperation of various countries in the semiconductor field face new challenges and changes. The subsequent development of related events is worthy of continuous attention.
This article was published on this website by the author's pseudonym: Betty on September-7-2024 PM 6:27 Saturday GMT+8 . It's an original article. Reproduction is prohibited. The content of the article is for entertainment and reference only. Do not blindly believe it.
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